HiPIMS电源的设计基础及研究进展EI北大核心CSCD

作为高功率脉冲磁控溅射(HiPIMS)技术的核心组成部分,HiPIMS电源在很大程度上决定着HiPIMS技术的研究进展和应用潜能。关于HiPIMS电源的研究整体上可以分为三个部分,分别是AC-DC功率变换器的研究、DC-DC功率变换器的研究以及HiPIMS功率负载的研究。其中,功率变换器是HiPIMS电源的直流供电端,技术特征依赖于脉冲电源共性技术,而功率负载部分则与HiPIMS放电模式相互影响。在综述脉冲电源的核心技术高动态响应、低输入电流纹波、高电压增益、高性能功率校正因数等研究现状的基础上,进一步总结基于HiPIMS放电特性的脉冲功率负载设计的研究现状,并展望HiPIMS电源亟待解决的关键问题,最终得出大功率HiPIMS电源需要从电力电子技术和等离子体物理技术两方面同步开展研究,指出基于真空等离子体物理特性的复合脉冲放电技术,将成为HiPIMS电源技术跳跃发展的必由之路。通过HiPIMS电源的设计基础及研究进展,为HiPIMS电源的进一步发展提供一定参考。

Design Basis and Research Progress of HiPIMS Power Supply

As the core component of high power magnetron sputtering (HiPIMS) technology, HiPIMS power supply largely determines the research progress and application potential of HiPIMS technology. On the whole, the research on HiPIMS power supply can be divided into three parts: the research of AC-DC power converter, DC-DC power converter and HiPIMS plasma power load. Among them, the power converter is the DC power supply end of HiPIMS power supply, and its technical characteristics depend on the common technology of pulse power supply, while the power load part interacts with the discharge mode of HiPIMS. On the basis of summarizing the research status of the core technologies of pulse power supply: high dynamic response, low input current ripple, high voltage gain and high performance power correction factor. The research status of pulse power load design based on HiPIMS discharge characteristics are summarized, and finally the key problems to be solved in HiPIMS power supply is discussed, it is expected to provide some reference for the further development of HiPIMS.