基于高功率脉冲磁控溅射的Cr膜层研究进展EI北大核心CSCD

Cr膜层因其优异的耐高温、耐腐蚀和耐磨损性能,在航空航天、武器装备和核电能源等领域得到广泛应用。由于传统电镀硬铬技术具有一定的污染,人们一直致力于寻找一种无污染的高性能Cr膜层制备方式。具备清洁特性的物理气相沉积技术,尤其是具有高离化率和高结合力特点的高功率脉冲磁控溅射(HiPIMS)技术现已成为膜层研究领域的热点。介绍HiPIMS-Cr靶的放电特性,指出在Cr膜沉积过程中获得高Cr离化率的条件;对比HiPIMS-Cr膜层与传统工艺(电镀硬铬、直流磁控沉积溅射、电弧混合溅射等)制备的Cr膜层在表面形貌、微观组织和力学性能等方面的差异,概述不同工艺组合对Cr膜层沉积速率的影响,探讨不同影响因素对HiPIMS-Cr膜层的微观组织、力学性能的影响及相关研究进展。最后对HiPIMS-Cr膜层制备及其应用研究的趋势进行展望。

Research Progress of Cr Coating Based on High Power Impulse Magnetron Sputtering

Due to the excellent resistance to high temperature, corrosion and wear, chromium coating (Cr coating) is widely used in the areas of aerospace, weaponry and nuclear power. Since the traditional hard plating technology is environmentally hazardous, an unpolluted and high-performance preparation method of Cr coating is desired. Therefore, the physical vapor deposition technique with environment friend, especially the high power impulsed magnetron sputtering technique with high dissociation rate and bonding characteristic is obtained more focus. This paper introduces the discharge characteristics of the HiPIMS-Cr target and identifies the conditions for obtaining a high Cr dissociation rate during Cr coating deposition. The differences in surface morphology, microstructure and mechanical properties of the Cr coating prepared by the HiPIMS and the traditional technique (e.g., hard chromium plating, DC magnetron deposition sputtering, arc ion plating, etc.) are compared. The effect of different process combinations on the deposition rate of the Cr coating is outlined. Furthermore, the influential factors on the microstructure and performance of HiPIMS-Cr coatings are investigated and the related research progress is discussed. Finally, the future developing in the preparation and application of HiPIMS-Cr coatings is put forward.