| 微波ECR等离子体溅射法沉积ZnO薄膜 |
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| 引用本文： | 刘一声. 微波ECR等离子体溅射法沉积ZnO薄膜[J]. 压电与声光, 1992, 14(2): 41-46 |
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| 作者姓名： | 刘一声 |
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| 作者单位： | 四川压电与声光技术研究所 |
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| 摘 要： | 低温沉积薄膜技术在制作先进的微电子学器件和集成多功能传感器方面非常重要。最近,应用微波电子回旋共振(ECR)等离子体溅射法沉积成高性能、高沉积速率和低基片温度的ZnO薄膜。本文叙述应用微波ECR等离子体溅射法沉积ZnO膜的制法及其性能。
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| 关 键 词： | ZnO薄膜 等离子体溅射 沉积 制备 |
Zinc Oxide Thin Films Prepared Using Microwave ECR Plasma Sputtering Method |
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| Liu Yisheng. Zinc Oxide Thin Films Prepared Using Microwave ECR Plasma Sputtering Method[J]. Piezoelectrics & Acoustooptics, 1992, 14(2): 41-46 |
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| Authors: | Liu Yisheng |
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| Affiliation: | Sichuan Institute of Piezoelectric and Acoustooptic Technology |
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| Abstract: | The low-temperature deposition technique for thin films is of great importance in fabrication of advanced microelectronic devices and integrated multi-spneor chip. Recently,the microwave electron-cyclotron-resonance(ECR) plasma sputtering method has been employed to deposite ZnO thin film, which possesses some advantages of high performance, high depositing rate and low substrate temperature. This paper reviewed the preparation and properties of ZnO thin films using ECR plasma sputtering method. |
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| Keywords: | ZnO thin film ECR plasma microwave plasma sputtering |
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