首页 | 本学科首页   官方微博 | 高级检索  
     


The effect of sputter etching on the surface characteristics of dyed aramid fabrics
Authors:Shigenobu Kobayashi  Tomiji Wakida  Shouhua Niu  Satoshi Hazama  Taisuke Ito  Yoshiyuki Sasaki
Abstract:Three kinds of aramid fabrics, Technora (modified p-aramid), Conex (m-aramid) and Kevlar (p-aramid), were subjected to sputter etching and argon low-temperature plasma treatments after dyeing in black with disperse dyes. The depth of shade increased considerably on Technora and Kevlar with the sputter etching treatment, but not on Conex fabrics. Argon low-temperature plasma treatment had virtually no effect on the depth of shade on the aramid fabrics.
Keywords:
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号