| W和W/Ti合金靶材的应用及其制备技术 |
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| 引用本文： | 王庆相,范志康. W和W/Ti合金靶材的应用及其制备技术[J]. 粉末冶金技术, 2009, 27(1) |
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| 作者姓名： | 王庆相 范志康 |
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| 作者单位： | 西安理工大学材料科学与工程学院,西安,710048 |
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| 基金项目： | 国家自然科学基金，高等学校博士学科点专项科研基金 |
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| 摘 要： | 近年来随着磁控溅射技术的应用日趋广泛,对各种高纯金属及合金溅射靶材的需求量也愈来愈大.本文简要介绍了当前W和W/Ti合金靶材的应用和制备方法等,对W和W/Ti合金靶材未来的制备技术进行了展望.
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| 关 键 词： | 靶材 应用 制备技术 |
Application and manufacturing technology of tungsten and tungsten-titanium targets |
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| Wang Qingxiang,Fan Zhikang. Application and manufacturing technology of tungsten and tungsten-titanium targets[J]. Powder Metallurgy Technology, 2009, 27(1) |
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| Authors: | Wang Qingxiang Fan Zhikang |
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| Affiliation: | School of Materials Science and Engineering;Xi'an University of Technology;Xi'an 710048;China |
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| Abstract: | Magnetron sputtering is a widely used method for thin film deposition in recent year,the demands of sputtering target materials with super high purity are greatly increased.In this paper,the application and manufacturing technology of tungsten and tungsten-titanium targets are discussed.At last,the developing tendency of the manufacturing technology of tungsten and tungsten-titanium targets is forecasted in this paper. |
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| Keywords: | target application manufacturing technology |
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