Analysis of Oxidized <Emphasis Type="Italic">p</Emphasis>-GaN Films Directly Grown Using Bias-Assisted Photoelectrochemical Method |
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Authors: | Li-Hsien Huang Kai-Chuan Kan Ching-Ting Lee |
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Affiliation: | (1) Institute of Microelectronics, Department of Electrical Engineering, National Cheng Kung University, Tainan, Taiwan, Republic of China;(2) Institute of Electro-Optical Science and Engineering, National Cheng Kung University, Tainan, Taiwan, Republic of China |
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Abstract: | A bias-assisted photoelectrochemical oxidation method was used to oxidize p-GaN directly. Secondary-ion mass spectrometry and x-ray photoelectron spectroscopy were used to analyze the grown films,
confirming that the p-GaN can be oxidized using the bias-assisted PEC oxidation method. In addition, x-ray diffraction was used to analyze the
crystalline phase of the grown films annealed at different temperatures. After annealing the oxide films at 700°C in O2 ambient for 2 h, the oxidized p-GaN films were converted from amorphous to the β-Ga2O3 crystalline phase. |
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Keywords: | Photoelectrochemical oxidation method secondary-ion mass spectrometry x-ray photoelectron spectroscopy x-ray diffraction |
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