| 弯曲轴静电聚焦—偏转复合系统的象差计算 |
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| 引用本文： | 刘志雄,西门纪业.弯曲轴静电聚焦—偏转复合系统的象差计算[J].电子学报,1992,20(6):36-42. |
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| 作者姓名： | 刘志雄 西门纪业 |
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| 作者单位： | 北京大学无线电电子学系，北京大学无线电电子学系 北京 100871，北京 100871 |
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| 摘 要： | 本文对透镜后偏转和透镜中偏转的两种静电聚焦一偏转复合系统的三级几何象差和一级色差进行了数值计算。计算结果表明,在匹配弯曲轴的情况下,这种复合系统有可能获得较小的偏转象差,同时本文也给出了判断复合系统中聚焦场与偏转场真正匹配的某些判据。
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| 关 键 词： | 偏转 复合系统 色差 弯曲轴 微电子 |
Calculations of Aberrations for Combined Electrostatic Focusing-Deflection Systems with Curvilinear Optical Axes |
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| Liu Zhixiong,Ximen Jiye.Calculations of Aberrations for Combined Electrostatic Focusing-Deflection Systems with Curvilinear Optical Axes[J].Acta Electronica Sinica,1992,20(6):36-42. |
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| Authors: | Liu Zhixiong Ximen Jiye |
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| Abstract: | In this paper the third order geometric and first order chromatic aberrations for two types of combined electrostatic focusing-deflection systems, i. e. post-lens deflection system and in-lens deflection system, have numerically been calculated. The computational results show that in the case of matched curvilinear optical axes, it is possible to achieve smaller deflection aberrations in such combined systems. In the meantime, certain criteria for truly matching between focusing and deflection fields in combined systems have also been given. |
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| Keywords: | Combined electrostatic focusing-deflection system Geometric aberration Chromatic aberration Curvilinear optical axis |
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