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Photocatalytic properties of Cr-doped TiO2 films prepared by oxygen cluster ion beam assisted deposition
Authors:G.H. Takaoka  T. Nose  M. Kawashita
Affiliation:Photonics and Electronics Science and Engineering Center, Kyoto University, Nishikyo, Kyoto 615-8510, Japan
Abstract:We prepared Cr-doped titanium dioxide (TiO2) films by oxygen (O2) cluster ion beam assisted deposition method, and investigated photocatalytic properties of the films as well as crystallographic property, optical property and surface morphology. The films prepared at a substrate temperature below 200 °C were found to be amorphous from the X-ray diffraction measurement. For the substrate temperatures such as 300 °C and 400 °C, the films exhibited rutile and/or anatase structures. The film surface measured by the atomic force microscope (AFM) was smooth at an atomic level. Furthermore, the optical band gap decreased with increase of Cr-composition, and it was approximately 3.3 eV for the non-doped films, 3.2 eV for the 1% Cr-doped films and 3.1 eV for the 10% Cr-doped films, respectively. With regard to the photocatalytic properties of the Cr-doped TiO2 films, we measured the change of contact angle as well as the photocatalytic degradation of methylene blue by the UV light irradiation. Compared with the non-doped films, the 1% Cr-doped films prepared at a substrate temperature of 400 °C showed high degradation efficiency. In addition, the contact angle of the 1% Cr-doped films with an initial value of 60° decreased to 10° by the UV light irradiation for 20 min, and the films exhibited the predominant properties of photocatalytic hydrophilicity even for the UV light irradiation with longer wavelengths.
Keywords:TiO2   Anatase   Rutile   Cluster ion beam   Photocatalytic property   Contact angle   AFM
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