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Magneto-sensitive nickel nanowires fabricated by electrodeposition into multi- and single-ion track templates
Authors:T. Ohgai  I. Enculescu  C. Zet  L. Westerberg  K. Hjort  R. Spohr  R. Neumann
Affiliation:(1) Materials Research Department, Gesellschaft für Schwerionenforschung (GSI), D-64291 Darmstadt, Germany;(2) The Svedberg Laboratory, Uppsala University, Box 533, S-75121 Uppsala, Sweden;(3) The Angstrom Laboratory, Uppsala University, Box 534, S-75120 Uppsala, Sweden;(4) Faculty of Engineering, Nagasaki University, Nagasaki 852-8521, Japan;(5) National Institute of Materials Physics, 76900 Bucharest, Romania
Abstract:Polycarbonate templates of (30±1) μm thickness containing cylindrical etched-track nanochannels of (500±50) nm diameter were used for electrodeposition of Ni nanowires. Using 104 channels per cm2, the most favourable deposition potential of  − 1.0 V was determined in a potentiostatic mode by varying the deposition potential with respect to an Ag/AgCl reference electrode over a range between  − 0.1 V and  − 1.5 V. The deposition efficiency at  − 1.0 V was estimated around 10%. The resulting single wires had a resistance around 200 Ω and showed an anisotropic magnetoresistance (AMR) effect of 1%, applicable to directionally sensitive magnetic field sensors.
Keywords:electrodeposition  ion beam  magnetoresistance  nanochannel  nickel  polycarbonate
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