Observation and nucleation control of Ge nanoislands on Si(111) surfaces using scanning reflection electron microscopy

Using a high-resolution scanning reflection electron microscope with multifunctions, we investigate Ge nucleation processes on clean Si(111) surfaces and form Ge islands on them by controlling step arrangements of Si(111) surfaces and by using focused electron beam (EB)-induced surface reactions. It is found that three-dimensional (3D) Ge islands grow selectively at step band areas on the surfaces without growth of the islands at terrace areas. Three-dimensional Ge nanoislands are formed at given points by stimulating the Ge wetting layer using focused electron beams and scanning tunnelling microscopy. Ge nanoislands are also formed by depositing Ge on Si windows in ultrathin SiO2 films and subsequent annealing of the sample. The islands are formed only at the window positions. These results imply new methods for forming Ge quantum dots or nanostructures at given areas.