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| 半导体元件清洗技术浅谈 | |
| 引用本文： | 朱文平,宫建国.半导体元件清洗技术浅谈[J].洗净技术,2003(8):17-19. |
| 作者姓名： | 朱文平 宫建国 |
| 作者单位： | 深圳市科威信洗净科技有限公司,深圳,518110 |
| 摘 要： | 随着社会的进步和科学技术的迅猛发展,对洗净技术的要求也越来越高。清洗方式多种多样,但最主要的是突出在喷射清洗和超声波清洗两大方面,应用于全国各行各业,并且也得到了明显进步。 |
| 关 键 词： | 半导体清洗 喷射 超声波 |
Brief Talk on Cleaning Technology for Semi-conductor Elements |
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| Authors: | Zhu Wenping Gong Jianguo |
| Affiliation: | Zhu Wenping Gong Jianguo |
| Abstract: | with the progress of society and extreme development of technology that demanding is the more higher and higher. A variety of cleaning manner but spray cleaning and ultrasonic cleaning are the most extruding. It apply to every work of life in country and received distinctness advancement. |
| Keywords: | semiconductor cleaning spray ultrasonic cleaning machine cavitation vibration board chemical solvent cleaning solvent ultrasonic frequency cleaning impression |
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