| 用于立体光刻的自由基光敏树脂研究与应用 |
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| 引用本文： | 阴金香 刘国文. 用于立体光刻的自由基光敏树脂研究与应用[J]. 辐射研究与辐射工艺学报, 1998, 16(3): 169-172 |
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| 作者姓名： | 阴金香 刘国文 |
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| 作者单位： | 清华大学化学系 |
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| 摘 要： | 对用于立体光刻技术中的自由基光敏树脂进行了研究。研究了齐聚物和稀释单体的分子结构、分子量大小、反应性官能团密度对固化物硬度、柔韧性的影响规律。得到了两种价格低，性能优良的光敏树脂材料。为自由基型高分子光敏树脂材料的应用打下了基础。
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| 关 键 词： | 自由基 光敏树脂 立体光刻 光刻树脂 |
RESEARCH AND APPLICATION OF FREE RADICAL PHOTOSENSITIVE RESIN USED FOR STEREOLITHOGRAPHY |
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| Yin Jinxiang Liu Guowen Men Huaidong Hong Xiaoyin. RESEARCH AND APPLICATION OF FREE RADICAL PHOTOSENSITIVE RESIN USED FOR STEREOLITHOGRAPHY[J]. Journal of Radiation Research and Radiation Processing, 1998, 16(3): 169-172 |
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| Authors: | Yin Jinxiang Liu Guowen Men Huaidong Hong Xiaoyin |
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| Abstract: | This paper studies on the photosensitive resin of free radical system used for stereolithography. The effect of the molecule structure, molecule weight, functional group density of the prepolymers and diluent monomers on hardness, flexibility of cured products has been investigated. In addition two kinds of new photosensitive resin with low cost and good preperties have been obtained. This research provides a good basis for application of free radical photosensitive resin. |
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| Keywords: | Free radical system Photosensitive resin Stereolithography |
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