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氮化碳薄膜制备及性能研究进展
引用本文:肖兴成,宋力昕,胡行方.氮化碳薄膜制备及性能研究进展[J].无机材料学报,1999,14(3):343-351.
作者姓名:肖兴成  宋力昕  胡行方
作者单位:中国科学院上海硅酸盐研究所; 上海 200050
摘    要:本文对氮化碳的结构及制备工艺如溅射、化学气相沉积、离子束辅助沉积、激光烧蚀等作了较为详细的总结与分析,对各种制备工艺条件下的氮化碳的性能包括力学、电学及光学性能进行了讨论,并对今后的发展趋势提出了自己的见解.

关 键 词:氮化碳  超硬膜  制备工艺  性能  
收稿时间:1998-6-11
修稿时间:1998-7-15

Advances in the Study of Preparation and Properties of Carbon Nitride
XIAO Xing-Cheng,SONG Li-Xin,HU Xing-Fang.Advances in the Study of Preparation and Properties of Carbon Nitride[J].Journal of Inorganic Materials,1999,14(3):343-351.
Authors:XIAO Xing-Cheng  SONG Li-Xin  HU Xing-Fang
Affiliation:Shanghai Institute of Ceramics; Chinese Academy of Sciences Shanghai 200050 China
Abstract:A detailed review was made on the structure of the carbon nitride together with its preparation process such as sputtering, chemical vapor deposition, ion assisted deposition and laser ablation.The resulting mechanical, electronic and optical properties were discussed, followed by the analysis for further studies.
Keywords:carbon nitride  superhard films  process  properties
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