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| 磁控溅射Ni_(56)Mn_(27)Ga_(17)高温形状记忆薄膜的马氏体相变与组织结构 | |
| 引用本文： | 刘超,牟海维,高新成,夏法锋,高智勇,蔡伟. 磁控溅射Ni_(56)Mn_(27)Ga_(17)高温形状记忆薄膜的马氏体相变与组织结构[J]. 功能材料, 2009, 40(11) |
| 作者姓名： | 刘超 牟海维 高新成 夏法锋 高智勇 蔡伟 |
| 作者单位： | 1. 大庆石油学院,电子科学学院,黑龙江,大庆,163318 2. 大庆石油学院,现代教育技术中心,黑龙江,大庆,163318 3. 大庆石油学院,机械科学与工程学院,黑龙江,大庆,163318 4. 哈尔滨工业大学,材料科学与工程学院,黑龙江,哈尔滨,150001 |
| 摘 要： | 采用磁控溅射方法制备了Ni_(56)Mn_(27)Ga_(17)高温形状记忆合金薄膜,研究了薄膜的马氏体相变行为和组织结构.试验结果表明,Ni_(56)Mn_(27)Ga_(17)薄膜马氏体相变开始温度高达584K,该薄膜室温下为非调制四方结构马氏体.透射电镜观察进一步表明,其马氏体亚结构为(111)I型孪晶. |
| 关 键 词： | 形状记忆合金 薄膜 磁控溅射 |
Martensitic transformation and microstructure of the magnetron-sputtered Ni_(56)Mn_(27)Ga_(17) high temperature shape memory alloy thin film |
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| LIU Chao,MU Hai-wei,GAO Xin-cheng,XIA Fa-feng,GAO Zhi-yong,CAI Wei. Martensitic transformation and microstructure of the magnetron-sputtered Ni_(56)Mn_(27)Ga_(17) high temperature shape memory alloy thin film[J]. Journal of Functional Materials, 2009, 40(11) | |
| Authors: | LIU Chao MU Hai-wei GAO Xin-cheng XIA Fa-feng GAO Zhi-yong CAI Wei |
| Affiliation: | LIU Chao1,MU Hai-wei1,GAO Xin-cheng2,XIA Fa-feng3,GAO Zhi-yong4,CAI Wei4(1. School of Electronics Science,Daqing Petroleum Institute,Daqing 163318,China,2. Modern Education Technique Center,3. School of Mechanical Science and Engineering,4. School of Materials Science and Engineering,Harbin Institute of Technology,Harbin 150001,China) |
| Abstract: | The Ni56Mn27Ga17 high temperature shape memory alloy thin film has been prepared by using magnetron sputtering method. The martensitic transformation and microstructure of the thin film have been systematically investigated in this work. The results show that the martensitic transformation start temperature is approximate 584K,and it is also found that the martensite of the thin film is nonmodulated tetragonal structure at room temperature. TEM observations and selected-areas electron diffraction analysis r... |
| Keywords: | Ni-Mn-Ga Ni-Mn-Ga shape memory alloys thin film magnetron sputtering |
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