Physicochemical properties of the surface and near-surface region of epitaxial n-GaAs layers modified by atomic hydrogen |
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Authors: | N. A. Torkhov S. V. Eremeev |
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Affiliation: | (1) Research Institute of Semiconductors (NIIPP), State Research and Production Enterprise, Tomsk, 634045, Russia;(2) Siberian Physicotechnical Institute, Tomsk State University, Tomsk, 634050, Russia;(3) Institute of Strength Physics and Materials Science, Siberian Division, Russian Academy of Sciences, Tomsk, 634055, Russia |
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Abstract: | Changes in the static electrical parameters of the Au-GaAs Schottky barriers in the (n-n +)-GaAs structures treated with atomic hydrogen are closely related to modification of the chemical properties of the surface layers in these structures, including changes in the rate of n-GaAs etching in a DMF-monoethanol amine (1:3) solution, in the electrochemical deposition rate and the structure of the resulting Au layer, and in the degree of passivation of linear defects emerging on the surface. The unprotected surface of epitaxial n-GaAs(100) layer exhibited virtually no etch pits upon the treatment in atomic hydrogen at 100°C. For n-GaAs protected with a 50-Å-thick SiO2 film, a drop in the etching rate and a considerable decrease in the number of etch pits, as well as a decrease in the thickness of electrochemically deposited gold layer and a change in is structure, were observed for the samples treated in atomic hydrogen at all temperatures in the range studied (100–400°C). |
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