Ion Density Distribution in an Inductively Coupled Plasma Chamber |
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| Authors: | Chen Junfang Zhao Wenfeng Wu XianqiuFan Shuangli Fu SilieSchool of Physics Telecommunications Engineering South China Normal University Guangzhou China |
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| Affiliation: | School of Physics and Telecommunications Engineering, South China Normal University, Guangzhou 510631, China;School of Physics and Telecommunications Engineering, South China Normal University, Guangzhou 510631, China;School of Physics and Telecommunications Engineering, South China Normal University, Guangzhou 510631, China;School of Physics and Telecommunications Engineering, South China Normal University, Guangzhou 510631, China;School of Physics and Telecommunications Engineering, South China Normal University, Guangzhou 510631, China |
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| Abstract: | The ion density distribution in the reaction chamber was diagnosed by a Langmuir probe. The rules of the ion density distribution were obtained under the pressures of 9 Pa, 13 Pa,27 Pa and 53 Pa in the reaction chamber, different radio-frequency powers and different positions.The result indicates that the ion density decreases as the pressure increases, and increases as the power decreases. The ion density of axial position z = 0 achieves 5.8×10 10 on the center of coil under the power of 200 w and pressure of 9 Pa in the reaction chamber. |
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| Keywords: | inductively coupled plasma ion density distribution angmuir probe |
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