| 衍射光学元件分析和设计中标量理论的局限性 |
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| 引用本文： | 陈德伟,李永平.衍射光学元件分析和设计中标量理论的局限性[J].光电工程,2004,31(6):9-13. |
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| 作者姓名： | 陈德伟 李永平 |
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| 作者单位： | 中国科学技术大学物理系,安徽,合肥,230026;中国科学技术大学物理系,安徽,合肥,230026 |
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| 基金项目： | 国家 863 高技术资助课题 |
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| 摘 要： | 以衍射光栅为例,用标量理论和严格耦合波理论的对比,分析衍射光学元件各参数对标量理论适用范围的影响。结果表明在光栅周期减小,刻蚀深度增加,光栅折射率增加,光束入射角度增加以及填充因子偏离 50%等情况下,标量理论的误差将逐渐增大,其中光栅周期和刻蚀深度对标量理论的影响较大,光栅周期小到 5 倍波长或者刻蚀深度大到 5 倍波长时,标量理论将不再适用。
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| 关 键 词： | 衍射光学元件 标量理论 衍射光栅 |
| 文章编号： | 1003-501X(2004)06-0009-05 |
| 收稿时间： | 2003/5/29 |
Limitation of scalar method to the analysis and design of diffractive optics elements |
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| CHEN De-wei,LI Yong-ping.Limitation of scalar method to the analysis and design of diffractive optics elements[J].Opto-Electronic Engineering,2004,31(6):9-13. |
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| Authors: | CHEN De-wei LI Yong-ping |
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| Abstract: | The limitation of scalar method for diffractive grating is evaluated by comparison with rigorous coupled-wave analysis. The accuracy of scalar method degrades as the grating period decreases or as the etch depth, the refractive index and the incident angle increases, or as the filling factor departs from 50%. The effects of the grating period and the etch depth are most serious , when the grating period is less than 5 times of wavelength or the etch depth is larger than 5 times of wavelength, the scalar method can not be applied to the analysis of DOE(Diffractive Optics Elements). The results are applicable to non-periodic as well as periodic elements. |
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| Keywords: | Diffractive optics elements Scalar method Diffractive grating |
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