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外延GaN基薄膜表面晶体结构RHEED图像研究
引用本文:郎佳红,秦福文,顾彪. 外延GaN基薄膜表面晶体结构RHEED图像研究[J]. 半导体技术, 2006, 31(8): 579-582,587
作者姓名:郎佳红  秦福文  顾彪
作者单位:安徽工业大学,电气信息学院,安徽,马鞍山,243002;大连理工大学,三束材料改性国家重点实验室,辽宁,大连,116024
基金项目:安徽省高校青年教师科研项目
摘    要:论述了反射高能电子衍射(RHEED)作为外延薄膜进行原位监测的一个重要手段以及RHEED图像与外延薄膜的表面形貌的关系,提出了以RHEED图像分析外延GaN基薄膜晶格结构的演变情况,并从衬底α-Al2O3的等离子体清洗、氮化进行了具体的分析和演算.结论指出,RHEED不仅是进行外延薄膜原位监测,而且还可以作为分析外延薄膜晶体结构演变的一个有力手段.

关 键 词:蓝宝石  清洗  氮化  反射高能电子衍射
文章编号:1003-353X(2006)08-0579-04
收稿时间:2006-03-07
修稿时间:2006-03-07

Study of Surface Lattice Transform of Epitaxial GaN-Based Films by Using RHEED
LANG Jia-hong,QIN Fu-wen,GU Biao. Study of Surface Lattice Transform of Epitaxial GaN-Based Films by Using RHEED[J]. Semiconductor Technology, 2006, 31(8): 579-582,587
Authors:LANG Jia-hong  QIN Fu-wen  GU Biao
Abstract:Based on the relation to images of RHEED for situ monitoring growth of GaN-based epitaxy film and surface feature of epitaxy film, the transformation of the crystal lattice of growing surface of epitaxy film from RHEED images in different processes, such as hydrogen-nitrogen plasma cleaning and nitridation of sapphire substrate was given. The result indicated that RHEED was advance for monitoring the growth of epitaxy film in situ, but also was a strongly tool for analyzing the crystal lattice transformation of epitaxy film.
Keywords:sapphire   cleaning   nitridation   RHEED
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