退火对用PLD法制备ZnO薄膜的发光影响

用脉冲激光沉积(PLD)方法在Si(111)和蓝宝石衬底上制备的氧化锌薄膜,在不同的退火温度和不同的退火氛围中进行了退火处理.退火温度及退火氛围对ZnO薄膜的结构和发光特性的影响用X射线衍射(XRD)谱和光致发光谱进行了表征.实验结果表明,随着退火温度的提高,ZnO薄膜的压应力减小,并向张应力转化.在不同的退火温度退火...

Effect of annealing on optical properties of ZnO thin films

Zinc oxide thin films fabricated on si (111) and sapphire substrates by pulsed laser deposition (PLD) were annealed at different temperature and in different ambient, respectively. The effect of annealing temperature and annealing ambient on structural and optical properties of ZnO thin films has been characterized by X-ray diffraction (XRD) and photoluminescence (PL) spectra. The experimental results show that with the increase of annealing temperature the press stress of ZnO thin films is decreased and shifted towards strain stress. PL spectra of ZnO thin films annealed at different temperature indicate that the UV emission is increasing with increasing annealing temperature, and the visible emission is decreasing. The results annealed on sapphire in oxygen ambient shows that the thin film possesses small strain stress, and the UV emission is the highest.