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Si掺杂对缺陷诱导的GaN磁性的影响
引用本文:张蕾,邢怀中,黄燕,张会媛,王基庆. Si掺杂对缺陷诱导的GaN磁性的影响[J]. 红外与毫米波学报, 2011, 30(3): 229-233
作者姓名:张蕾  邢怀中  黄燕  张会媛  王基庆
作者单位:1. 东华大学应用物理系,上海,201620
2. 中国科学院上海技术物理研究所国家红外物理室,上海,200083
3. 华东师范大学电子工程系,上海,200241
摘    要:利用第一性原理局域密度自旋近似方法,研究了缺陷诱导的GaN的内禀磁性以及Si掺杂对缺陷GaN磁性的影响.研究发现缺陷诱导GaN的内禀磁矩为3μB,Si掺杂后缺陷诱导的GaN磁矩发生淬灭为2μB.随Si含量的增加磁矩进一步减少.该理论结果对实验有指导意义.

关 键 词:GaN:Si  第一性原理  磁性
收稿时间:2010-08-30
修稿时间:2010-11-14

The effect of Si co-doping on defect-induced intrinsic magnetism in GaN
ZHANG Lei,XING Huai-Zhong,HUANG Yan,ZHANG Hui-Yuan and WANG Ji-Qing. The effect of Si co-doping on defect-induced intrinsic magnetism in GaN[J]. Journal of Infrared and Millimeter Waves, 2011, 30(3): 229-233
Authors:ZHANG Lei  XING Huai-Zhong  HUANG Yan  ZHANG Hui-Yuan  WANG Ji-Qing
Affiliation:Donghua University
Abstract:Using the first principle method within the local spin density approximation, both the magnetism of defect induced in GaN and the effect of Si co-doping on the magnetism in GaN with defect. It is found that defect induced intrinsic magnetic moment of GaN is 3 , while the magnetic moment is quenched to 2 in Si co-doping GaN:Si. The moment decreases with increasing of the concentration of Si. The result is very helpful for experiment.
Keywords:GaN:Si   the first principles   magnetism
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