Simple, low-cost technique for photolithographic self-aligned top metal contacts to nanowires and nanotubes |
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Authors: | Oon C H Thong J T L |
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Affiliation: | Singapore-MIT Alliance, 4 Engineering Drive 3, 117576, Singapore. |
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Abstract: | We propose a new simple, low-cost method for providing all-round metal contacts to one-dimensional structures such as carbon nanotubes and nanowires on a transparent substrate. The nanostructures are first positioned in place to bridge a electrode gap by dielectrophoresis. The electrode structure is then used as a self-aligned mask during the subsequent photolithography through illumination from the substrate backside. This is followed by metallization and lift-off. Our measurements on multi-walled carbon nanotubes thus contacted show reasonable yield and good electrical contacts for the process carried out on a glass slide as the substrate. |
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