Second-order optical nonlinearity in thermally poled phosphorus-doped silicon dioxide thin-film waveguides |
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| Authors: | Chen HY Lin HY |
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| Affiliation: | Advanced Manufacturing Research Center, Department of Electronic Engineering, Huafan University, No. 1, Huafan Road, Shih-Ting, Taipei County 22301, Taiwan; |
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| Abstract: | A phosphorus-doped silicon dioxide nonlinear planar waveguide on a GE124 fused silica substrate using plasma-enhanced chemical vapour deposition and thermal poling technique is implemented. The stable second-order nonlinear susceptibility induced in the waveguide is estimated to be around 0.58 pm/V by means of hydrofluoric acid etching, Maker?s fringe measurement and grid search curve fitting using a double-step nonlinear profile. This nonlinear planar waveguide may be applied to fabricate an electrooptic device on the silicon photonic chip. |
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