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Deposition of chromium aluminum nitride coatings by arc ion plating
引用本文:张淑娟 李明升 冯长杰 刘庭芝 多树旺. Deposition of chromium aluminum nitride coatings by arc ion plating[J]. 中国有色金属学会会刊, 2007, 17(A02): 780-784
作者姓名:张淑娟 李明升 冯长杰 刘庭芝 多树旺
作者单位:[1]Jiangxi Key Laboratory of Surface Engineering, Jiangxi Science and Technology Normal University, Nanchang 330013, China [2]Department of Materials Science and Engineering, Nanchang Institute of Aeronautical Technology, Nanchang 330063, China
基金项目:Project(50401022) supported by the National Natural Science Foundation of China; Project(0650034) supported by the Natural Science Foundation of Jiangxi Province, China
摘    要:Cr-Al-N ternary coatings were deposited by arc ion plating method using isolated Cr target and Al target. The influence of AlN content on the phase change was studied by synthesizing Cr1-xAlxN coatings with different x values. The effects of substrate negative bias on the surface morphology, deposition rate and phase structure were investigated. As the aluminum content increases, the structure of (Cr1-xAlx)N changes from Bl(NaCl) phase to B4(wurtzite) phase. The critical content of A1N solubilized in B 1 (NaCl) lattice is close to 0.7. With the increasing pulse negative bias, the deposition rate decreases constantly, the droplet contamination is more serious, the ion-etching effect on coating surface is more obvious, and the change of preferred orientation and the shift of XRD peak take place.

关 键 词:铬铝氮涂层 电弧离子电镀法 电沉积 相变
收稿时间:2007-07-15
修稿时间:2007-09-10

Deposition of chromium aluminum nitride coatings by arc ion plating
ZHANG Shu-juan, LI Ming-sheng , FENG Chang-jie, LIU Ting-zhi, DUO Shu-wang. Deposition of chromium aluminum nitride coatings by arc ion plating[J]. Transactions of Nonferrous Metals Society of China, 2007, 17(A02): 780-784
Authors:ZHANG Shu-juan   LI Ming-sheng    FENG Chang-jie   LIU Ting-zhi   DUO Shu-wang
Abstract:
Keywords:chromium aluminum nitride   arc ion plating   phase change   pulse bias
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