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Improvement of efficiency and temperature control of induction heating vapor source on electron cyclotron resonance ion source
Authors:Takenaka T  Kiriyama R  Muramatsu M  Kitagawa A  Uchida T  Kurisu Y  Nozaki D  Yano K  Yoshida Y  Sato F  Kato Y  Iida T
Affiliation:Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan. takenaka@i-beam.jp
Abstract:An electron cyclotron resonance ion source (ECRIS) is used to generate multicharged ions for many kinds of the fields. We have developed an evaporator by using induction heating method that can generate pure vapor from solid state materials in ECRIS. We develop the new matching and protecting circuit by which we can precisely control the temperature of the induction heating evaporator. We can control the temperature within ±15?°C around 1400?°C under the operation pressure about 10(-4) Pa. We are able to use this evaporator for experiment of synthesizing process to need pure vapor under enough low pressure, e.g., experiment of generation of endohedral Fe-fullerene at the ECRIS.
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