| Mo电极形貌对AIN薄膜择优取向生长的影响 |
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| 引用本文： | 熊娟,顾豪爽,胡宽.Mo电极形貌对AIN薄膜择优取向生长的影响[J].功能材料与器件学报,2010,16(2). |
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| 作者姓名： | 熊娟 顾豪爽 胡宽 |
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| 作者单位： | 湖北大学物理学与电子技术学院,武汉,430062 |
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| 摘 要： | 采用射频磁控溅射方法在不同形貌的Mo电极上制备了(002)择优取向的AlN薄膜。采用XRD、FESEM表征了Mo电极及AlN薄膜的结构、表面形貌及择优取向。结果表明,Mo电极的形貌影响AlN薄膜的择优取向生长,在较高溅射气压下沉积的Mo电极晶粒细小、分布均匀,有助于AlN薄膜(002)择优取向生长。
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| 关 键 词： | 磁控溅射 Mo电极 AIN薄膜 择优取向 |
Influences of molybdenum electrodes'morphologies on the orientation Of AIN thin film |
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| XIONG Juan,GU Hao-shuang,HU Kuan.Influences of molybdenum electrodes'morphologies on the orientation Of AIN thin film[J].Journal of Functional Materials and Devices,2010,16(2). |
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| Authors: | XIONG Juan GU Hao-shuang HU Kuan |
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| Abstract: | Mo electrode and(002)-oriented AIN films were deposited by reactive magnetron sputtering under various sputtering pressures.The films were characterized by X-ray diffraction(XRD),atomic force microscopy(AFM)and field-emission scanning electron microscopy(FESEM).It was found that the orientation of AIN films was influenced by the morphologies of Mo electrodes.The AIN films deposited on Mo electrode performs as fine grains exhibits highly(002)orientation. |
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| Keywords: | Sputtering Mo electrode AIN thin film orientation |
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