| 磁控溅射制备SiC薄膜的高温热稳定性 |
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| 引用本文： | 祝元坤,朱嘉琦,韩杰才,梁军,张元纯. 磁控溅射制备SiC薄膜的高温热稳定性[J]. 材料研究学报, 2009, 23(4) |
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| 作者姓名： | 祝元坤 朱嘉琦 韩杰才 梁军 张元纯 |
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| 作者单位： | 1. 哈尔滨工业大学复合材料研究所,哈尔滨,150001
2. 中国汽车工业工程公司,天津,300190 |
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| 基金项目： | 国家高技术研究发展计划2006AA0764和哈尔滨市青年创新人才专项资金2007RFQXG039资助项目 |
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| 摘 要： | 采用磁控溅射方法在Si基底上制备SiC薄膜,研究了SiC薄膜经不同温度和气氛条件高温退火前后结构、成份的变化.结果表明,薄膜主要以非晶为主,由Si-C键,C-C键和少量Si的氧化物杂质组成;在真空条件下经高温退火后,薄膜C-C键的含量减少,而Si-C键的含量增加,真空退火有利于SiC的形成;在800℃空气中退火后,薄膜表面生成一层致密的SiO2薄层,阻止了氧气与薄膜内部深层的接触,有效保护了内部的SiC.在空气条件下,SiC薄膜在800℃具有较好的热稳定性.
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| 关 键 词： | 无机非金属材料 磁控溅射 热稳定性 高温退火 SiC薄膜 |
High-temperature thermal stability research on SiC thin films by magnetron sputtering |
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| ZHU Yuankun,ZHU Jiaqi,HAN Jiecai,LIANG Jun,ZHANG Yuanchun. High-temperature thermal stability research on SiC thin films by magnetron sputtering[J]. Chinese Journal of Materials Research, 2009, 23(4) |
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| Authors: | ZHU Yuankun ZHU Jiaqi HAN Jiecai LIANG Jun ZHANG Yuanchun |
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| Affiliation: | ZHU Yuankun~1 ZHU Jiaqi~(1**) HAN Jiecai~1 LIANG Jim1 ZHANG Yuanchun~2 1.Center for Composite Materials,Harbin Institute of Technology,Harbin 150001 2.China Automobile Industry Engineering Cooperation,Tianjin 300190 |
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| Abstract: | SiC thin films were grown on Si substrates by magnetron sputtering.The structural and component changes of the films,pre and post high temperature annealing at different temperature and atmosphere conditions,were studied.The results show that the films are characterized by the amorphous microstructure and mainly composed of Si-C bondings,C-C bondings as well as a small mount of oxide impurity consorted with Si;the content of the C-C bondings decreased after annealing in vacuum,meanwhile the Si-C bondings co... |
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| Keywords: | inorganic non-metallic materials magnetron sputtering thermal stability hightemperature annealing SiC films |
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