Constrained sintering of 8 mol% Y2O3 stabilised zirconia films |
| |
| Authors: | Xin Wang Jung-Sik Kim Alan Atkinson |
| |
| Affiliation: | 1. Graduate School of Environmental Studies, Tohoku University, 6-6-01 Aramaki-Aoba, Aoba-ku, Sendai 980-8579, Japan;2. Department of Materials Science and Engineering, Norwegian University of Science and Technology, 7491, Trondheim, Norway;3. IMRAM, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai, 980-8577, Japan;4. Research Institute for Electromagnetic Materials, 2-1-1 Yagiyama Minami, Taihaku-ku, Sendai, 982-0807, Japan;5. Graduate School of Engineering, Tohoku University, 6-6-01 Aramaki-Aoba, Aoba-ku, Sendai 980-8579, Japan |
| |
| Abstract: | Constrained sintering kinetics of 8 mol% Y2O3/92 mol% ZrO2 (8YSZ) films approximately 10–15 μm thick screen-printed on dense YSZ substrates, and the resulting stress induced in the films, were measured in the temperature range 1100–1350 °C. The results are compared with those reported earlier for 3YSZ films.Both materials behave similarly, although there are differences in detail. The constrained densification rate was greatly retarded compared with the unconstrained densification rate due to the effect of the constraint on the developing anisotropic microstructure (3YSZ) and, in the case of 8YSZ, considerable grain growth. The stress generated during constrained sintering was typically a few MPa. The apparent activation energies for free sintering, constrained sintering, creep and grain growth are found to cover a wide range (135–670 kJ mol?1) despite all probably being mainly controlled by grain boundary cation diffusion. |
| |
| Keywords: | |
| 本文献已被 ScienceDirect 等数据库收录！ |
|
