首页 | 本学科首页   官方微博 | 高级检索  
     

WC-Co硬质合金基体上高附着力金刚石薄膜的制备
引用本文:杨仕娥,鲁占灵,樊志琴,姚宁,张兵临.WC-Co硬质合金基体上高附着力金刚石薄膜的制备[J].无机材料学报,2005,20(1):235-238.
作者姓名:杨仕娥  鲁占灵  樊志琴  姚宁  张兵临
作者单位:郑州大学材料物理教育部重点实验室, 郑州 450052
基金项目:河南省科技攻关项目(991110130)
摘    要:采用微波等离子体化学气相沉积(CVD)法在WC-Co硬质合金基体上制备金刚石膜, 研究了TiNx中间层的引入对金刚石薄膜质量及其附着性能的影响. 结果表明, 在酸浸蚀脱钴处理的基础上, 通过预沉积氮含量呈梯度变化的TiNx中间过渡层, 可在硬质合金基体上制备出高质量的金刚石薄膜; 压痕法测试其临界载荷达1000N.

关 键 词:金刚石薄膜  中间层  形核密度  附着力  
文章编号:1000-324X(2005)01-0235-04
收稿时间:2003-12-29
修稿时间:2004-4-5

Highly Adherent Diamond Film Deposited onto WC-Co Cemented Carbide Substrate
YANG Shi-E,LU Zhan-Ling,FAN Zhi-Qin,YAO Ning,ZHANG Bing-Lin.Highly Adherent Diamond Film Deposited onto WC-Co Cemented Carbide Substrate[J].Journal of Inorganic Materials,2005,20(1):235-238.
Authors:YANG Shi-E  LU Zhan-Ling  FAN Zhi-Qin  YAO Ning  ZHANG Bing-Lin
Affiliation:Ministry of Education Key Laboratory of Material Physics, Zhengzhou University, Zhengzhou 450052, China
Abstract:Diamond films were deposited onto WC-Co cemented carbide substrate by using microwave plasma chemical vapor deposition(CVD). The effects of TiNx interlayer introduced on the diamond film quality and its adhesion to the substrate were investigated. The results show that by pre-depositing TiNx interlayer in which nitrogen concentration changes gradually, the diamond film on the cemented carbide substrate etched by acid solution has very good quality; and its critical load measured by indentation test, is as high as 1000N.
Keywords:diamond film  interlayer  nucleation density  adhesion
本文献已被 CNKI 维普 万方数据 等数据库收录!
点击此处可从《无机材料学报》浏览原始摘要信息
点击此处可从《无机材料学报》下载全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号