| 脉冲激光沉积TiN/AlN多层膜的微结构与力学性能 |
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| 引用本文： | 唐普洪. 脉冲激光沉积TiN/AlN多层膜的微结构与力学性能[J]. 上海电力学院学报, 2010, 0(12) |
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| 作者姓名： | 唐普洪 |
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| 作者单位： | 浙江工业大学机械制造及自动化教育部重点实验室;嘉兴职业技术学院; |
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| 基金项目： | 国家自然科学基金资助项目(50975259); 浙江省自然科学基金青年科技人才培养资助项目(R405031); 嘉兴市科技计划资助项目(2009AY2007) |
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| 摘 要： | 采用脉冲激光沉积(LPA)法,在单晶Si表面制备了调制周期为50nm的不同调制比的TiN/AlN多层膜,并研究了调制比对多层膜微结构和力学性能的影响。扫描电镜(SEM)和原子力显微镜(AFM)显示,薄膜的调制比在1～4之间。并且小调制比下薄膜表面的岛密度小,岛面积过大,分布不均匀,相邻岛之间的起伏较大。X射线衍射(XRD)结果表明,小调制比下,AlN相为明显的(002)择优取向,TiN相主要以(200)、(220)形式存在;调制比增大后,AlN相的择优取向减弱,同时伴随着薄膜晶粒的细化及硬度增强,这一研究结果说明,调制比对多层膜的性质有一定的影响,大调制比会导致Al元素在界面处聚集,并与TiN进行合金化后的形成TiAlN结构,进而对薄膜的硬度产生影响。
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| 关 键 词： | 脉冲激光沉积(PLA) 多层膜 TiN/AlN 微观结构 纳米压痕 |
Microstructure and mechanical properties of TiN/AlN multilayer films deposited by pulsed laser ablation |
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| TANG Pu-hong. Microstructure and mechanical properties of TiN/AlN multilayer films deposited by pulsed laser ablation[J]. Journal of Shanghai University of Electric Power, 2010, 0(12) |
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| Authors: | TANG Pu-hong |
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| Affiliation: | The Key Laboratory of Mechanical Manufacture , Automation of Educatioin Mislistry of China,Zhejiang University of Technology,Hangzhou 310014,China, College of Jiaxing Vocational Technology,Jiaxing 314036,China |
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| Abstract: | In this study,polycrystalline TiN/AlN multilayer film with various modulation ratios was deposited onto silicon substrate using pulsed laser ablation.The microstructure and the nanoindentation hardness of TiN/AlN multilayer films were also investigated.SEM and AFM confirmed a standard modulation ratio ranging from 1 to 4,the least density and large tracts of island had been found in small modulaton ratio.XRD revealed that an obvious preferred orientation(002) is appeared in AlN phase,and orientation(200)(22... |
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| Keywords: | pulsed laser ablation(PLA) multilayer films TiN/AlN microstructure |
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