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低压气相金刚石薄膜镀膜刀具膜/基附着性能压痕测试分析
引用本文:龙剑平,汪灵,张湘辉,常嗣和.低压气相金刚石薄膜镀膜刀具膜/基附着性能压痕测试分析[J].材料工程,2006(9):57-63.
作者姓名:龙剑平  汪灵  张湘辉  常嗣和
作者单位:1. 成都理工大学,材料与化学化工学院,成都,610059;成都理工大学,金刚石薄膜实验室,成都,610059
2. 成都理工大学,材料与化学化工学院,成都,610059
基金项目:国家自然科学基金 , 四川省教育厅资助项目 , 四川省科技攻关项目 , 成都理工大学校科研和教改项目
摘    要:低压气相金刚石薄膜硬质合金刀具在直流弧光放电等离子体CVD镀膜设备上制备.基底为YG6(WC-6%Co,质量分数)硬质合金刀具.采用洛氏(HRA)、表面洛氏(HRM)、维氏(HV)硬度试验机对所制备的金刚石薄膜刀具进行压痕测试;采用扫描电镜(SEM)观察压痕形貌并定性评价膜/基附着性能.结果表明:所制备的金刚石薄膜镀膜刀具的优选膜/基附着性能压痕测试方法是表面洛氏压痕法;优选测试条件为采用120°金刚石圆锥压头,测试加载载荷441N.

关 键 词:金刚石薄膜  硬质合金刀具  附着性能  压痕测试  等离子体CVD
文章编号:1001-4381(2006)09-0057-07
收稿时间:2005-11-07
修稿时间:2006-06-20

Impression Test Study on Adhesion Between Substrate and Diamond Film Deposited by Low Pressure Vapor Deposition
LONG Jian-ping,WANG Ling,ZHANG Xiang-hui,CHANG Si-he.Impression Test Study on Adhesion Between Substrate and Diamond Film Deposited by Low Pressure Vapor Deposition[J].Journal of Materials Engineering,2006(9):57-63.
Authors:LONG Jian-ping  WANG Ling  ZHANG Xiang-hui  CHANG Si-he
Abstract:The diamond film was deposited on WC-6%Co(mass fraction) cemented carbide by DC arc discharged plasma chemical vapor deposition.Impression test was conducted by Rockwell hardness test,Rockwell superficial hardness test and Vickers hardness test.The scanning electron microscope was used to observe the impression microstructure and qualitalitively evaluate adhesion between diamond film and substrate.The result shows that the preferring hardness impression test is Rockwell superficial hardness test,test parameter including copped diamond depressor loading 441N.
Keywords:diamond film  cemented carbide  adhesion  impression test  plasma CVD
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