Comparison of spatial compositional uniformity and dislocation density for organometallic vapor phase epitaxial Hg1?x CdxTe grown by the direct alloy and interdiffused growth processes

Etch pit density and spatial compositional uniformity data are presented for organometallic vapor phase epitaxial Hg_1−x Cd_x Te grown by the direct alloy and interdiffused growth methods. For alloy growth, composition variation is as low as Δx=0.004 and 0.02 over 2- and 3-in diam areas, respectively; while for growth on CdZnTe substrates, etch pit density values lower than 2×10⁵ cm⁻² have been achieved. For interdiffused growth on CdZnTe, etch pit density values lower than 5×10⁵ cm⁻² have been obtained, while the composition variation is usually Δx≤0.004 and 0.014 over 2- and 3-in diam areas, respectively. Data demonstrate that the choice of particular CdZnTe substrate strongly affects the subsequent etch pit density measured in the layer. Reasonably uniform n-type doping over 3-in diam area using the source triethylgallium is also reported for both growth methods.