| 高纯钨研究现状及制备工艺方法综述 |
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| 引用本文： | 刘文胜,龙路平,马运柱.高纯钨研究现状及制备工艺方法综述[J].粉末冶金技术,2012,30(3):223-228. |
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| 作者姓名： | 刘文胜 龙路平 马运柱 |
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| 作者单位： | 中南大学粉末冶金国家重点实验室,长沙,410083 |
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| 基金项目： | 国家自然科学基金资助项目 |
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| 摘 要： | 高纯钨具有很高的附加价值,其市场前景与集成电路发展密切相关,高纯钨的净化是目前高纯钨生产中的重要研究课题。简要介绍了国内外高纯钨的生产现状、制备工艺及其纯度表征,在此基础上进行了展望。
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| 关 键 词： | 高纯钨 微电子 钨靶 净化 精炼 |
Research and preparation methods for high-purity tungsten |
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| Liu Wensheng
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Long Luping
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Ma Yunzhu.Research and preparation methods for high-purity tungsten[J].Powder Metallurgy Technology,2012,30(3):223-228. |
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| Authors: | Liu Wensheng Long Luping Ma Yunzhu |
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| Affiliation: | (State Key Laboratory for Powder Metallurgy,Central South University,Changsha 410083,China) |
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| Abstract: | High purity tungsten has very high added value,its market prospect and development is closely related to the development of integrated circuit,the purification of high purity tungsten is an important research topic in production of high purity tungsten at present.In this paper,the production situation of high purity tungsten,preparation technology,characterization of purity were reviewed. |
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| Keywords: | high purity tungsten microelectronics tungsten target purification refining |
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