Reduction in internal friction in silica glass with high OH content

The aim of this article was to investigate processes occurring during annealing of silica glass classified as being of type III (J Non Cryst Solids. 1970;5(2):123-75). This is an inexpensive silica glass produced by many manufacturers across the globe. However, it can be successfully used for fabrication of high-Q mechanical resonators. The relationship between residual internal stress and internal friction is elucidated. Quantitative analysis of the structural relaxation kinetics is presented. The influence of the cooling process for structural transformation is also discussed. On the basis of our results, we suggest optimal annealing conditions for minimizing internal friction type III silica glass. The results will be useful for further improvement of the Q-factor of mechanical resonators, including the test masses of the next generation of gravitational wave detectors. Our approach might, in addition, be used for studying the modification of atomic structure in multicomponent glasses.