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用脉冲多弧离子源研制镍铬铁合金膜
引用本文:蔡长龙,杭凌侠,严一心,李宸章.用脉冲多弧离子源研制镍铬铁合金膜[J].光学仪器,1999(Z1).
作者姓名:蔡长龙  杭凌侠  严一心  李宸章
作者单位:西安工业学院仪器工程系!西安710032(蔡长龙,杭凌侠,严一心),西安西北光电仪器厂!西安710000(李宸章)
摘    要:介绍了采用脉冲多弧离子源镀制镍铬铁合金膜的新技术,研究了采用这一新技术镀制镍铬铁合金膜的镀制工艺,对采用这一新技术所镀制的镍铬铁合金膜进行了性能测试。结果表明:选用合适的工艺参数,采用这一新技术镀制的镍铬铁合金膜膜层均匀,牢固度好,膜层成分与脉冲多弧离子源阴极靶材成分含量误差小于±3% ,符合实际应用要求

关 键 词:镍铬铁合金膜  薄膜沉积  离子镀  均匀性  工艺参数  薄膜性能

Study on Nickel Chrom-Iron Alloy Film by Means of The Pulse Multi-arc Ion Source
CAI Changlong,HANG Lingxia,YAN Yixin.Study on Nickel Chrom-Iron Alloy Film by Means of The Pulse Multi-arc Ion Source[J].Optical Instruments,1999(Z1).
Authors:CAI Changlong  HANG Lingxia  YAN Yixin
Abstract:In this paper, a new technique plating the nickel chrome iron alloy film by means of the pulse multi arc ion source is introduced. In research work, the plating technology of the film with this technique is obtained and the property of the film is measured. Result indicated that:the technology parameters, the technique, the uniformity and firmity of the film is appropriate. The error of the composition content between the film material and the cathode material of the pulse multi arc ion source is less than±3%. The film accords with actual demands.
Keywords:Nickel  chrome  iron Alloy Film  Film Deposition  Ion Plating  Uniformity  Technology Parameter  Film Property  
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