Compound Bragg reflection filters made by spatial frequencydoubling lithography |
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Authors: | Henry CH Shani Y Kistler RC Jewell TE Pol V Olsson NA Kazarinov RF Orlowsky KJ |
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Affiliation: | AT&T Bell Labs., Murray Hill, NJ; |
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Abstract: | A report is presented on the fabrication of complex Bragg filters with resonant wavelengths near 1.55 μm, patterned by photolithography using a high-resolution deep ultraviolet stepper. The projection of gratings with quarter-micrometer features was made possible by the use of spatial frequency-doubling lithography. A single chip, processed entirely in the silicon facility, was used to demonstrate five Bragg reflectors of different wavelengths, a quarter-wave shifted resonator, broadband stacked filters with as many as 15 uniform Bragg reflector sections of different Bragg wavelengths, and broadband stacked filters containing a passband within the reflection band. The filters exhibited nearly ideal spectral behavior |
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