电弧离子镀制备TiBN纳米复合涂层

目的在纯N_2气氛环境下,低温制备TiBN纳米复合涂层,为TiBN涂层工业化生产积累科学数据。方法采用离子源增强阴极电弧离子镀系统,在硬质合金衬底上制备TiBN纳米复合涂层,系统研究了N_2气压对TiBN涂层晶体结构、表面形貌、硬度和耐磨性能的影响。结果 N_2气压对TiBN纳米复合涂层的晶体结构、表面形貌、硬度及摩擦系数的影响明显。随着N_2气压的升高,TiBN涂层中的TiN晶相逐渐增多,TiB_2晶相逐渐减少,为TiN晶粒和TiB_2晶粒镶嵌于非晶BN基体的复合结构。在0.5 Pa气压下,涂层硬度达3150HV。对于对磨材料硬质合金而言,TiBN涂层的摩擦系数为0.4左右。结论离子源增强电弧离子镀技术可以用于TiBN涂层的制备,制备出的TiBN涂层为纳米晶镶嵌于非晶的纳米复合涂层,涂层的显微硬度较高。在TiBN纳米复合涂层的工业化生产中,沉积N_2气压不宜偏高。

Deposition of TiBN Nanocomposite Coatings by Cathodic Arc Plating

The work aims to gather scientific data for industrial production of TiBN coating by preparing TiBN nanocomposite coating at low temperature in pure N2. TiBN coating was deposited on cemented carbide substrates by using ion source-enhanced cathodic arc ion plating system. Effects of N2 pressure on crystal microstructure, morphology, hardness and wear resistance of the TiBN coating were investigated systemically. Facts proved that N2 pressure had obvious effects on crystal microstructure, morphology, hardness and friction coefficient of the coating. As the N2 pressure increased, TiN crystal phases in the TiB2 coating increased while TiB2 crystal phases decreased. The structure of TiBN coating was a composite structure with TiN crystal grains and TiB2 crystal grains embedded in amorphous BN substrate. The microhardness was up to 3150HV at the N2 pressure of 0.5 Pa. For grinding material cemented carbide, The friction coefficient of TiBN coating was nearly 0.4. Ion source-enhanced arc ion plating technology can be used to prepare TiBN coating, a nanocomposite coating of high microhardness with nanocrystalline embedded in amorphous substrate. The pressure of N2 should be low during industrial production of TiBN nanocompisite coating.