首页 | 本学科首页   官方微博 | 高级检索  
     


Interfaces between - and silicon
Authors:P Boulenc  I Devos
Affiliation:aSTMicroelectronics, 850 avenue Jean Monnet, F-38926 - Crolles Cedex, France;bDépartement ISEN, Institut d’Electronique de Microélectronique et de Nanotechnologie, 41 boulevard Vauban, 59046 - Lille Cedex, France
Abstract:As the epitaxy of crystalline LaAlO3 has not been realized yet, we investigated the use of a γ-Al2O3 buffer layer between the high-κ and the substrate. We firstly studied the structural matching of γ-Al2O3(0 0 1) with a Si(0 0 1)-p(2×1) reconstructed surface. According to experimental data and computations in the density functional theory framework, we found stable interfaces between γ-Al2O3 and Si which encounters surface reconstruction changes. These interfaces satisfy the criterion of an insulating buffer layer.
Keywords:γ  -Al2O3  High-κ    Epitaxy  Interface
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号