Interfaces between - and silicon |
| |
Authors: | P Boulenc I Devos |
| |
Affiliation: | aSTMicroelectronics, 850 avenue Jean Monnet, F-38926 - Crolles Cedex, France;bDépartement ISEN, Institut d’Electronique de Microélectronique et de Nanotechnologie, 41 boulevard Vauban, 59046 - Lille Cedex, France |
| |
Abstract: | As the epitaxy of crystalline LaAlO3 has not been realized yet, we investigated the use of a γ-Al2O3 buffer layer between the high-κ and the substrate. We firstly studied the structural matching of γ-Al2O3(0 0 1) with a Si(0 0 1)-p(2×1) reconstructed surface. According to experimental data and computations in the density functional theory framework, we found stable interfaces between γ-Al2O3 and Si which encounters surface reconstruction changes. These interfaces satisfy the criterion of an insulating buffer layer. |
| |
Keywords: | γ -Al2O3 High-κ Epitaxy Interface |
本文献已被 ScienceDirect 等数据库收录! |
|