| 光学元件的磁流变精密抛光实验分析 |
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| 引用本文： | 周虎,李蓓智,陈少梅. 光学元件的磁流变精密抛光实验分析[J]. 制造技术与机床, 2009, 0(11) |
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| 作者姓名： | 周虎 李蓓智 陈少梅 |
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| 作者单位： | 东华大学机械工程学院,上海,201620 |
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| 摘 要： | 通过对光学工件进行较大范围的磁流变抛光实验,获得了加工后整个抛光平面粗糙度的分布规律和影响平面度的抛光工艺参数.该实验对于确立大尺寸光学元件抛光工艺提供了依据,并为后续装置研究和完善提供了新的思路.
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| 关 键 词： | 磁流变抛光 工艺参数 实验分析 粗糙度 |
Experiment and Analysis on Precise Polishing of Optical Elements on MRF |
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| ZHOU Hu,LI Beizhi,CHEN Shaomei. Experiment and Analysis on Precise Polishing of Optical Elements on MRF[J]. Manufacturing Technology & Machine Tool, 2009, 0(11) |
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| Authors: | ZHOU Hu LI Beizhi CHEN Shaomei |
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| Abstract: | Through finishing experiments on the optical parts in a larger scale, the technical parameters which affect the distribution of roughness and planeness were obtained. It also laid a foundation for the determination of MRF technics and provides a new illumination for the improvements of the equipments. |
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| Keywords: | Magnetorheoiogical Finishing Technical Parameters Experiment Analysis Surface Roughness |
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