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Evolution of Annealing Twins in Sputtered Cu Films
Authors:C. K. Yoon  D. P. Field
Affiliation:(1) Department of Materials Engineering, Technion-Israel Institute of Technology, Haifa, 32000, Israel;(2) Institute of Physical Metallurgy and Metal Physics, RWTH Aachen University, Aachen, 52056, Germany;(3) Institute of Solid State Physics, Russian Academy of Sciences, Chernogolovka, Moscow district, 142432, Russia;
Abstract:The Monte Carlo Potts model with n-fold method was used to simulate grain structure evolution in thin Cu films according to energetic competition principles. Surface/interface, grain boundary, and strain energy factors were applied to determine grain growth and crystallographic texture evolution as a function of film thickness. Furthermore, annealing twins were simulated through specific criteria that arbitrarily insert twin grains into the structure through grain boundary energy considerations. Four different types of microstructures were observed experimentally and simulated by the Monte Carlo technique.
Keywords:
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