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| 磁控反应溅射制备钇掺杂TiO_2薄膜的研究 | |
| 引用本文： | 张文杰,朱圣龙,李瑛,王福会,何红波. 磁控反应溅射制备钇掺杂TiO_2薄膜的研究[J]. 电镀与精饰, 2009, 31(3) |
| 作者姓名： | 张文杰 朱圣龙 李瑛 王福会 何红波 |
| 作者单位： | 1. 沈阳理工大学,环境与化学工程学院,辽宁,沈阳,110163;中国科学院,金属研究所,金属腐蚀与防护国家重点实验室,辽宁,沈阳,110016 2. 中国科学院,金属研究所,金属腐蚀与防护国家重点实验室,辽宁,沈阳,110016 3. 中国科学院,沈阳应用生态研究所,辽宁,沈阳,110016 |
| 基金项目： | 国家自然科学基金，国家重点基础研究发展规划(973计划) |
| 摘 要： | 采用混合靶直流磁控反应溅射法,在玻璃基体上溅射沉积了含有氧化钇的TiO2薄膜.X-射线光电子能谱分析结果表明,薄膜是由Y2O3和TiO2复合氧化物组成的.钇的存在会抑制薄膜中二氧化钛晶体的形成.薄膜的紫外可见光谱透射率略有下降,而反射率有所增加.钇的掺杂对二氧化钛薄膜的光催化活性起负作用,光催化降解甲基橙反应的活性随钇含量的增加而下降. |
| 关 键 词： | TiO2薄膜 磁控反应溅射 钇掺杂 光催化活性 降解 |
Yttrium Doped TiO_2 Films Prepared by DC Reactive Magnetron Sputtering |
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| ZHANG Wen-jie,ZHU Sheng-long,LI Ying,WANG Fu-hui,HE Hong-bo. Yttrium Doped TiO_2 Films Prepared by DC Reactive Magnetron Sputtering[J]. Plating & Finishing, 2009, 31(3) | |
| Authors: | ZHANG Wen-jie ZHU Sheng-long LI Ying WANG Fu-hui HE Hong-bo |
| Affiliation: | 1.School of Environmental and Chemical Engineering;Shenyang Ligong University;Shenyang 110168;China;2.State Key Laboratory for Corrosion and Protection;Institute of Metal research.The Chinese Academy of Sciences;Shenyang 110016;3.Institute of Applied Ecology;The Chinese Academy of Sciences;China |
| Abstract: | Y2O3 doped TiO2 films were prepared on glass substrates by means of pulsed DC reactive magnetron sputtering method using Ti and Y mixed target.XPS results showed that the films were composed of Y2O3-TiO2 composite oxides.The existence of yttrium inhibited the crystal growth of TiO2 in the films.UV-Visible transmittance of the films decreased slightly whereas their reflectance increased gently.Yttrium doping exerts detrimental effect on photocatalytic activity of the TiO2 films.Photocatalytic activity for de... |
| Keywords: | TiO2 film reactive magnetron sputtering Y doping photocatalytic activity degradation |
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