Optimization of the thickness of glass/TiO2/Ag/Ti/TiO2/SiON multilayer film |
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| Authors: | Liu YuWang Cong Diao XungangXue Yafei |
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| Affiliation: | Center for Condensed Matter and Material Physics and Key Laboratory of Micro-nano Measurement, Manipulation and Physics (Ministry of Education), Department of Physics, Beihang University, Beijing 100191, PR China |
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| Abstract: | The TiO2/Ag/Ti/TiO2/SiON multilayer film was deposited on glass substrate at room temperature using magnetron sputtering method. By varying the thickness of each layer, the optical property was optimized to achieve good selective spectral filtering performance in Vis-NIR region. The multilayer film achieves maximum transmittance of 92.7% at 690 nm, in which the both TiO2 layers are 33 nm. For good conductivity and transmittance, a 4 nm Ti layer and a 30 nm SiON layer are necessary. |
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| Keywords: | Magnetron sputtering D/M/D multilayer film Spectral selectivity Transmittance Film thickness Optimization |
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