248nm深紫外光刻胶 |
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引用本文: | 郑金红,黄志齐,侯宏森.248nm深紫外光刻胶[J].感光科学与光化学,2003,21(5):346-356. |
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作者姓名: | 郑金红 黄志齐 侯宏森 |
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作者单位: | 北京化学试剂研究所,北京,100022 |
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摘 要: | 本文从化学增幅技术的产生,深紫外248nm胶主体树脂及PAG发展历程、溶解抑制剂、存在的工艺问题及解决途径多个方面综述了深紫外248nm胶的发展与进步.
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关 键 词: | 化学增幅 KrF激光 深紫外光刻 248 nm光刻胶 主体树脂 酸催化 光致产酸剂 |
文章编号: | 1000-3231(2003)05-0346-11 |
修稿时间: | 2003年5月15日 |
EVOLUTION AND PROGRESS OF DEEP UV 248 nm PHOTORESISTS |
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Abstract: | Deep UV lithography operating at 248 nm with use of chemical amplification resists has finally become a production technology.This paper describes the evolution and progress of the deep UV 248 nm photoresists from aspects of birth of chemical amplification technology,evolution of deep UV 248 nm resists in matrix resins and PAG,dissolution inhibitor,processing problems and solutions of them. |
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Keywords: | chemical amplification KrF excimer laser deep UV lithography 248 nm photoresists matrix resins acid-catalysis photoacid generator |
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