多束SPPs干涉成像模拟研究

多束SPPs干涉光刻是一种可突破衍射极限的新型纳米加工方法。在分析SPPs激励和传输机理基础上，建立多束SPPs干涉成像模型，编制了能快速准确地计算多束SPPs干涉光刻成像的仿真软件。并在此基础上对多束SPPs的干涉像进行了模拟，发现如果将两束光增加到四束或八束光激发SPPs干涉，则可获得二维分布的周期性光斑点阵，在制作纳米光子晶体材料方面有很强的应用前景。随着入射SPPs的增加，当棱锥棱数足够多近似于一个圆锥时，干涉场会形成一系列的同心圆结构，可考虑实现纳米级波带片的制作。

Research on SPPs Interference Lithography Imaging Simulation

Multi-beam SPPs interference lithography is a kind of the new nano-processing methods which can break the diffraction limit. After analysing the SPPs transmission mechanism of incentives, we build a imaging model of multi-beam SPPs interference and a software which can be prepared quickly and accurately to calculate the multi-beam interference lithography imaging SPPs simulation. Based on this, we have simulated multi-beam interference of SPPs, and found that if the two beams of light to four or eight beam excited SPPs interference, we will receive a two-dimensional distribution of lattice periodic spot, which has a strong application prospects of nano-photonic crystal materials production. As the incident SPPs increase in the number of edges when the pyramid is similar to a cone enough. The interference field will form a series of concentric circles structure, and could be considered to achieve nanometer-level zone plate production.