| 半导体工业用镍铂合金靶材的制备及结构研究 |
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| 引用本文： | 王一晴,闻 明,郭俊梅,管伟明. 半导体工业用镍铂合金靶材的制备及结构研究[J]. 贵金属, 2015, 36(4): 27-31 |
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| 作者姓名： | 王一晴 闻 明 郭俊梅 管伟明 |
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| 作者单位： | 贵研铂业股份有限公司 稀贵金属综合利用新技术国家重点实验室，昆明贵金属研究所 云南省贵金属材料重点实验室，昆明 650106,贵研铂业股份有限公司 稀贵金属综合利用新技术国家重点实验室，昆明贵金属研究所 云南省贵金属材料重点实验室，昆明 650106,贵研铂业股份有限公司 稀贵金属综合利用新技术国家重点实验室，昆明贵金属研究所 云南省贵金属材料重点实验室，昆明 650106,贵研铂业股份有限公司 稀贵金属综合利用新技术国家重点实验室，昆明贵金属研究所 云南省贵金属材料重点实验室，昆明 650106 |
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| 基金项目： | 云南省对外科技合作计划项目(2014IA037)、云南省战略性新兴产业发展专项资金项目。 |
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| 摘 要： | 采用熔炼、均匀化退火处理及温轧技术制备出NiPt合金靶材。采用金相、扫描电镜(SEM)、X射线衍射(XRD)等手段对NiPt合金在制备过程中的结构变化进行了研究。同时也研究了靶材结构与靶材溅射后表面形貌之间的关联性。研究表明,均匀化处理对NiPt合金获得择优取向具有明显影响,合金经过铸造、均匀化、轧制等工艺,其硬度分别为292、218、439,可分别形成(200)织构、(311)织构、(200)+(220)织构。靶材微观结构与溅射后表面形貌均匀性具有关联性。
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| 关 键 词： | 金属材料；NiPt合金靶材；均匀化退火；轧制；择优取向；磁控溅射 |
| 收稿时间： | 2015-04-28 |
Preparation and Structure of NiPt Alloy Target Used in Semiconductor Industry |
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| WANG Yiqing,WEN Ming,GUO Junmei and GUAN Weiming. Preparation and Structure of NiPt Alloy Target Used in Semiconductor Industry[J]. Precious Metals, 2015, 36(4): 27-31 |
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| Authors: | WANG Yiqing WEN Ming GUO Junmei GUAN Weiming |
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| Affiliation: | State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Sino-Platinum Metals Co. Ltd., Yunnan Key Lab of Precious Metallic Materials, Kunming Institute of Precious Metals, Kunming 650106, China,State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Sino-Platinum Metals Co. Ltd., Yunnan Key Lab of Precious Metallic Materials, Kunming Institute of Precious Metals, Kunming 650106, China,State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Sino-Platinum Metals Co. Ltd., Yunnan Key Lab of Precious Metallic Materials, Kunming Institute of Precious Metals, Kunming 650106, China and State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Sino-Platinum Metals Co. Ltd., Yunnan Key Lab of Precious Metallic Materials, Kunming Institute of Precious Metals, Kunming 650106, China |
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| Abstract: | NiPt alloy target was produced by melting, homogenization annealing, and warm-rolling. The structural variation of NiPt alloy during preparation was observed by using metallography, scanning electron microscopy (SEM), X-ray diffraction (XRD), etc. And the relationship between the structure and surface morphologies of the target after sputtering was also investigated. The results show homogenization annealing treatment has obvious effect on the texture. The Vickers-hardness of the alloy after melting, homogenization annealing, and rolling was 292, 218, and 439, and the corresponding texture was (200), (311), and mixed (200) and (220), respectively. The microstructure of the target has relevance to the surface morphologies after sputtering. |
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| Keywords: | metal materials NiPt alloy target homogenization annealing rolling texture magnetron sputtering |
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