光刻工艺中金属层划片槽幻影的产生和解决方案

在光刻工艺中的显影步骤,显影液在溶解光刻胶的过程中,不同区域光刻胶的溶解速度存在着明显的差异,使得晶圆表面的显影反应存有时间差别。这种反应速率上的差别在实际的生产过程中会产生一些缺陷。金属层划片槽的幻影现象是该类缺陷的一种表现形式。如何去控制这些缺陷的产生,对于提高生产线良率将会显得很重要。文章针对光刻工艺中无钛-氮化钛膜层覆盖的金属层划片槽出现的幻影,分析并提出了产生该现象的机制,与此同时提出了几种解决该现象的方案。

Theory and Solution for Lithography Process Metal Layer Scribe Line Ghost Image

During developing progress in Lithography process,resist will resolve in the develop solution.Different area resist resolving speed is rarely different.It will cause the develop reaction time on the wafer surface has difference.This difference on the reaction rate will generate some defect during the production.Metal layer scribe line ghost image is one form of this defect.It is important to control these defects’ generation for improve the yield.This article analysis the theory of the ghost image in metal layer scribe line which not covered by Ti or TiN and also give several solution.