| 微波电子回旋共振等离子体溅射法沉积ZnO薄膜 |
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| 引用本文： | 汪建华 任兆杏. 微波电子回旋共振等离子体溅射法沉积ZnO薄膜[J]. 武汉化工学院学报, 1997, 19(2): 84-87 |
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| 作者姓名： | 汪建华 任兆杏 |
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| 作者单位： | 武汉化工学院，中国科学院等离子体物理研究所 |
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| 摘 要： | ＺｎＯ薄膜具有强的压电和光电效应，广泛用于制作各种声电和声光器件中．本文报道了用微波ＥＣＲ等离子体溅射法沉积了ＺｎＯ薄膜，并研究了该法制备ＺｎＯ膜的工艺．结果表明，所形成的ＺｎＯ膜的性质强烈地依赖于溅射沉积条件．
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| 关 键 词： | 氧化锌薄膜；微波ECR等离子体；溅射 |
Zinc Oxide Thin Films Prepared Using Microwave ECR Plasma Sputtering Method |
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| Wang Jianhua Ren Zhaoxing Wu Qinchong. Zinc Oxide Thin Films Prepared Using Microwave ECR Plasma Sputtering Method[J]. Journal of Wuhan Institute of Chemical Technology, 1997, 19(2): 84-87 |
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| Authors: | Wang Jianhua Ren Zhaoxing Wu Qinchong |
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| Affiliation: | Wang Jianhua Ren Zhaoxing Wu Qinchong |
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| Abstract: | Zinc oxide (ZnO)thin films with strong piezoelectric and piezooptic effects have been widely used in acousto-electric and acousto-optic devices.This paper reports on structural properties of ZnO films by microwave ECR plasma sputtering deposition and studies ZnO films processed.The results show that properties of the ZnO films formed in our work strongly rely on the sputter deposition condition. |
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| Keywords: | ZnO thin film ECR plasma Sputter |
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