电沉积层厚度分布均匀性的研究进展

厚度分布尽可能均匀是绝大多数电沉积应用场合努力实现的目标。从电解液组分、电源、电沉积槽、阳极与阴极的结构形状及布局、电解液的搅拌方式等方面介绍了它们与电沉积层厚度分布之间的关系及其研究进展。协同改善电沉积过程中阴极的电场与流场分布是众多研究的主要思路,并在经验性改进方案和案例性数值仿真方面取得很大进展。未来的探索应更多地从理论角度提出通用性解决方案。

Study P rogress of E lectrodeposited L ayer T hickness D istribution U niform ity

U niform thickness distribution is the goal to be accom plished in m ost of the electrodepositing application cases. The relationships of thickness uniform ity w ith the factors including electrolyte com positions,pow er supply,electrodepositing bath,electrodes and their arrangem ents,stirring m anners,and their research progresses w ere introduced. Synergistically im proving the distribution of electric field and flow field w as the m ain concept of studying thickness uniform ity problem s involved in this paper. G reat progress in the em pirical practicality and num erical sim ulation applications has been m ade. Future studies should be focus on establishing general theories to guide the solutions of uniform ly depositing.