Enhancing electron field emission of carbon nanoflakes by hydrogen post-annealing process |
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Authors: | Wen-Ching Shih Jian-Min Jeng Chin-Tze Huang Jyi-Tsong Lo |
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Affiliation: | (1) Graduate Institute in Electro-Optical Engineering, Tatung University, Taipei, Taiwan, ROC;(2) FED R&D Division, Tatung Company, Taipei, Taiwan, ROC |
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Abstract: | In this study, the carbon nanoflakes (CNFs) fabricated by sputtering were chosen as the field emission emitters because of
their very sharp and thin edges which are potentially good electron field emission sites. The as-deposited CNFs were annealed
in the furnace under hydrogen atmosphere. The results showed that the optimum field emission properties with smaller turn-on
field and larger current density were obtained at annealing temperature of 600 °C for 10 min. The hydrogen thermal annealing
has chemical etching on the surface of the CNFs and produces appropriate emission site density to increase the emission current
density. The turn-on field was reduced from 6.7 to 5.8 V/μm and electric current density was increased from 22 to 187 μA/cm2 under 8 V/μm after hydrogen thermal annealing. |
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