| 高精度30kV高压稳压电源的研制 |
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| 引用本文： | 陈振生.高精度30kV高压稳压电源的研制[J].电子与信息学报,1989,11(5):547-550. |
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| 作者姓名： | 陈振生 |
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| 作者单位： | 山东工业大学 济南 |
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| 摘 要： | 本文介绍了为新型电子束曝光机研制的高精度30kV高压稳压电源。该电源采用双闭环调整,集中补偿和分散补偿相结合的设计方案。对电源的关键性技术采取了有力措施,使各项技术指标均达到设计要求。
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| 关 键 词： | 高压稳压电源 高精度 高稳定性 |
| 收稿时间： | 1987-11-30 |
| 修稿时间： | 1989-1-16 |
DEVELOPMENT OF HIGH-PRECISION REGULATED POWER SUPPLY WITH 30kV HIGH VOLTAGE |
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| Chen Zhensheng.DEVELOPMENT OF HIGH-PRECISION REGULATED POWER SUPPLY WITH 30kV HIGH VOLTAGE[J].Journal of Electronics & Information Technology,1989,11(5):547-550. |
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| Authors: | Chen Zhensheng |
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| Affiliation: | Anandong Polytechnic University,Jinan |
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| Abstract: | A high-precision regulated power supply for a new type electron beam lithography system with 30 kV high voltage is recommended. The design scheme of double closed loop regulation and the design scheme of centralized compensation combined with dispersed compensation are adopted. In accordance with the technical requirements of regulated power supply, some key technigues have been properly handled. All it's qualifications satisfy or exceed the original design requirements. |
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| Keywords: | High voltage regulated power su ply High-precision High stability |
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