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Active appearance models using statistical characteristics of Gabor based texture representation
Authors:Yongxin Ge  Dan Yang  Jiwen Lu  Bo Li  Xiaohong Zhang
Affiliation:1. School of Software Engineering, Chongqing University, Chongqing 400044, China;2. Key Laboratory of Dependable Service Computing in Cyber Physical Society Ministry of Education, Chongqing 400044, China;3. Advanced Digital Sciences Center, Singapore 138632, Singapore;4. Department of Criminal Science and Technology, Chongqing Police College, Chongqing 400044, China
Abstract:Active appearance model (AAM) has been successfully applied to register many types of deformable objects in images. However, the high dimension of intensity used in AAM usually leads to an expensive storage and computational cost. Moreover, intensity values cannot provide enough information for image alignment. In this paper, we propose a new AAM method based on Gabor texture feature representation. Our contributions are two-fold. On one hand, based on the assumption that Gabor magnitude and Gabor phase follow a lognormal distribution and a general Gaussian distribution respectively, three simplified texture representations are proposed. One the other hand, we apply the proposed texture representations in AAM, which is the first time to extract statistical features from both Gabor magnitude and Gabor phase as the texture representation in AAM. Tests on public and our databases show that the proposed Gabor representations lead to more accurate and robust matching between model and images.
Keywords:Active appearance model (AAM)  Gabor wavelet  Image registration  Gabor magnitude  Gabor phase  Statistical model  Gamma distribution  Gamma Gaussian distribution
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